Plasma Etch and Strip in Microtechnology workshop (PESM 2023), June 19-20, 2023, Grenoble, France
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Plasma Etch and Strip in Microtechnology workshop (PESM 2023), June 19-20, 2023, Grenoble, France


14.12.2022

Announcement and Call for papers
 
We invite you to submit your papers for Plasma Etch and Strip in Microtechnology workshop.
This workshop is the 13th in a series devoted to plasma etch and strip processes for micro, nano and bio-technologies.
 
PESM 2023 will be held on June 19-20, 2023 in Grenoble, France.
 
We invite you to submit an abstract for oral or poster presentation in one of the following areas:
 
- Topic 1: Plasma etching processes for III-V and III-N semiconductor materials (CMOS, power, LED, solar cells...)
- Topic 2: Plasma etching processes for advanced memory technologies (OXRAM, PCRAM, FeRAM, MRAM...)
- Topic 3: Plasma processes for more than Moore applications (MEMS, NEMS, Imagers, Photonic...)
- Topic 4: Emerging plasma etching concept and technology fundamentals (Alternative lithography, ALE, TSD...)
- Topic 5: Plasma diagnostics and simulation (New Plasma Sources, Diagnostics, Modeling…)
 
 
KEY DATES:
OPENING FOR ABSTRACT SUBMISSION : January, 9th 2023
ABSTRACT SUBMISSION DEADLINE: February, 24th 2023
NOTIFICATION FOR AUTHORS: March, 24th 2023
 

Prospective authors are requested to submit an abstract. The abstract must clearly describe the nature, scope, content using the template on the PESM website. All abstracts will be reviewed by PESM committees. Accepted papers will be notified no later than March, 24th 2023
 
Please visit our website https://pesm2023.insight-outside.fr/ for further information.
 
We hope to meet you in Grenoble,
 
On behalf of the PESM 2023 organizing committee

 


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Plasma Etch and Strip in Microtechnology workshop (PESM 2023), June 19-20, 2023, Grenoble, France